• CVD CMP Pad Conditioner

    • Various patterns can be arranged CVD diamond coated tips
    • Apex of the CVD diamond coated tip is flat face
    • Allows to engineer the critical pressure applied to each tip for pad conditioning
    • EHWA has a patents on the tip size and number for pad conditioning
    • The apex where contacts the pad has not changed over the conditioning time
    • Pad cut rate is constant
  • Electroplated CMP Pad Conditioner

    • Mechanical Bonding (Ni plating)
    • Excellent disk flatness : Superior wafer uniformity
    • Clean disk surface : Near zero micro scratches.
  • New BSL CMP Pad Conditioner

    • Strong diamond holding force : Chemical reaction + Mechanical contact
    •  Corrosion resistance : Carbide interface between diamond & bond material
    • Longer lifetime : Utilization of edges by diamond face
    • Maximized diamond chip pocket by high diamond exposure
    • Excellent conditioning efficiency and pad debris removal rate

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