- Complex layer stack analysis possible
- Fully automatic/manual variable angle of incidence goniometer
- Automatic data acquisition
- Customizable user level: all engineers and user mode
- Powerful thin film, surface, and interface characterization measurement tools
- Mapping for all types and sizes of specimens Easy-to-use Windows-based measurement software with state-of-the-art, high-end system performance Measurement of thin
film thickness and optical constants Comprehensive optical constant database and model recipe provided Advanced measurement software provides NK table, dispersion or effective mediation of individual thin films approximation (EMA). · Different thickness analysis capabilities for many heterogeneous substrates · Various SE options and accessories such as mapping stage, wavelength extension, focus spot · 2D, 3D graphic output and user-friendly data management interface
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FILCON ® SE-DUV-VIS-NIR Ellipsometer (Spectroscopic Ellipsometer)
Spectroscopic ellipsometers can be configured to cover a wide wavelength range from DUV to NIR. The DUV range is useful for measuring ultra-thin films, such as in the nanometer thickness range. The deep UV range is also essential if you need to measure the band gap of a material or the measurement of native oxides on silicon wafers with a thickness of about 1 to 2 nm, while the visible or near-infrared range is used for measurements of relatively thick or very thick thin film coatings.
