• CHALLENGE 700-HT

    Additives for Post-Lap/Polish Rinse and In-Process Wet Storage of Parts

    CHALLENGE 700-HT is a synthetic formulation developed for the rinsing and wet storage of lapped/polished parts.

    Application areas:

    • Post-lap and post-polish wafer cleaning
    • Post-dicing and singulation rinse
    • CMP and PCMP cleaning
    • Ultrasonic/megasonic tank cleaning for optics and semiconductors
    • FPD glass and solar wafer cleaning
    • Wet storage and pre-bond prep



    5-gallon pails | 55-gallon drums

  • CHALLENGE 800 Series

    Aqueous Detergents For Ultrasonic/Megasonic Cleaning

    CHALLENGE 800 Series Products are water-based, ultrasonic/megasonic detergents formulated to increase the cavitational energy released upon substrate surfaces for more effective cleaning.

    Application areas:

    • Post-lap and post-polish wafer cleaning
    • Post-dicing and singulation rinse
    • CMP and PCMP cleaning
    • Ultrasonic/megasonic tank cleaning for optics and semiconductors
    • FPD glass and solar wafer cleaning
    • Wet storage and pre-bond prep



    5-gallon pails | 55-gallon drums

  • VECTOR HTC-SCA Series

    Ultrasonic/Megasonic Detergents

    VECTOR HTC-SCA Series are water-based detergents formulated to increase the cavitational energy released upon the substrate surface by ultrasonic or megasonic apparatus. The products are designed for more effective cleaning of post-lapped, post-etched and post-polished substrates.

    Application areas:

    • Post-lap and post-polish wafer cleaning
    • Post-dicing and singulation rinse
    • CMP and PCMP cleaning
    • Ultrasonic/megasonic tank cleaning for optics and semiconductors
    • FPD glass and solar wafer cleaning
    • Wet storage and pre-bond prep

    5-gallon pails | 55-gallon drums

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