• CHALLENGE 700-HT

    Additives for Post-Lap/Polish Rinse and In-Process Wet Storage of Parts

    CHALLENGE 700-HT is a synthetic formulation developed for the rinsing and wet storage of lapped/polished parts.

    Application areas:

    • Post-lap and post-polish wafer cleaning
    • Post-dicing and singulation rinse
    • CMP and PCMP cleaning
    • Ultrasonic/megasonic tank cleaning for optics and semiconductors
    • FPD glass and solar wafer cleaning
    • Wet storage and pre-bond prep



    5-gallon pails | 55-gallon drums

  • VECTOR HTR

    Additive for Rinsing Silicon Wafers — Post-Lapping/Polishing, Sawing and Texturing

    VECTOR HTR is a synthetic formulation developed for the rinsing and wet storage of substrates after lapping, polishing, sawing or texturing.

    Application areas:

    • Post-lap and post-polish wafer cleaning
    • Post-dicing and singulation rinse
    • CMP and PCMP cleaning
    • Ultrasonic/megasonic tank cleaning for optics and semiconductors
    • FPD glass and solar wafer cleaning
    • Wet storage and pre-bond prep



    5-gallon pails | 55-gallon drums

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