Used at economical dilution ratios, CHALLENGE 800 Series Products will remove light organics and sub-micron particles. They are typically used to remove post-process residues after grinding, slicing, lapping, etching and polishing. CHALLENGE 800 Series Products can be used in heated or unheated ultrasonic tanks, and are also recommended for brush and dip tank applications.
| Product | Dilution Ratio |
|---|---|
| CHALLENGE 803 Series | pH @ 3% = ~ 3.5 |
| CHALLENGE 807 Series | pH @ 3% = ~ 6.7 |
| CHALLENGE 810 Series | pH @ 3% = ~ 10.4 |
| CHALLENGE 813 Series | pH @ 3% = ~ 12.0 |
Directions
- It is recommended that evaluations of CHALLENGE 800 Series Products begin at a dilution of 3% mixed with deionized (DI) water. Tap water that does not contain hard water ions is also acceptable.
- The type/degree of residue to clean (organics, particles, etc.) and the surface energy of the material determine the CHALLENGE 800 Series Product to use.
- A trained Intersurface Dynamics Sales Engineer will assist in making the correct recommendation for optimum cleaning performance. Other factors to consider include temperature, exposure time and the power of the cleaning equipment in use.
Ultrasonic & Megasonic Cleaning
- Aqueous detergents designed for ultrasonic and megasonic equipment
- Remove fine particles and residues without damaging substrates
- Formulated for sensitive materials like optics, high-index glass, ceramics, and semiconductors




