CHALLENGE 800 Series

Aqueous Detergents For Ultrasonic/Megasonic Cleaning

CHALLENGE 800 Series Products are water-based, ultrasonic/megasonic detergents formulated to increase the cavitational energy released upon substrate surfaces for more effective cleaning.

Application areas:

  • Post-lap and post-polish wafer cleaning
  • Post-dicing and singulation rinse
  • CMP and PCMP cleaning
  • Ultrasonic/megasonic tank cleaning for optics and semiconductors
  • FPD glass and solar wafer cleaning
  • Wet storage and pre-bond prep



5-gallon pails | 55-gallon drums

Used at economical dilution ratios, CHALLENGE 800 Series Products will remove light organics and sub-micron particles. They are typically used to remove post-process residues after grinding, slicing, lapping, etching and polishing. CHALLENGE 800 Series Products can be used in heated or unheated ultrasonic tanks, and are also recommended for brush and dip tank applications.

Product Dilution Ratio
CHALLENGE 803 Series pH @ 3% = ~ 3.5
CHALLENGE 807 Series pH @ 3% = ~ 6.7
CHALLENGE 810 Series pH @ 3% = ~ 10.4
CHALLENGE 813 Series pH @ 3% = ~ 12.0

Directions


  • It is recommended that evaluations of CHALLENGE 800 Series Products begin at a dilution of 3% mixed with deionized (DI) water. Tap water that does not contain hard water ions is also acceptable.
  • The type/degree of residue to clean (organics, particles, etc.) and the surface energy of the material determine the CHALLENGE 800 Series Product to use.
  • A trained Intersurface Dynamics Sales Engineer will assist in making the correct recommendation for optimum cleaning performance. Other factors to consider include temperature, exposure time and the power of the cleaning equipment in use.

Ultrasonic & Megasonic Cleaning


  • Aqueous detergents designed for ultrasonic and megasonic equipment
  • Remove fine particles and residues without damaging substrates
  • Formulated for sensitive materials like optics, high-index glass, ceramics, and semiconductors

Certifications


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