Used at economical dilution ratios, VECTOR HTC-SCA Series will remove light organics, polymers and sub-micron particles typically found on the surface of semiconductor materials. These contaminants are often the cause of wafer staining and streaking upon examination after etch.
VECTOR HTC-SCA Series detergents are recommended for pre-cleaning and final cleaning stages of solar silicon production lines, wherever ultrasonic cleaning is applied. These products will remove organic and inorganic contamination and particles from both mono-crystalline and multi-crystalline silicon.
VECTOR HTC-SCA Series can be used in heated or unheated ultrasonic tanks, and are also recommended for brush and dip tank applications.
There are 6 Products in the SCA Series: VECTOR HTC-SCA, VECTOR HTC-SCA-N, VECTOR HTCSCA-1, VECTOR HTC-SCA-1-N, VECTOR HTC-SCA-2 and VECTOR SCA-13.
Directions
It is recommended that evaluation of VECTOR HTC-SCA Series begin at dilutions of 4% mixed with deionized (DI) water, although tap water that does not contain hard water ions is also acceptable. Since the type and degree of residue to be removed varies, these factors will ultimately determine specific “inhouse” dilutions. Other factors to consider include wafer exposure time and the power of the ultrasonic equipment in use.
Ultrasonic & Megasonic Cleaning
- Aqueous detergents designed for ultrasonic and megasonic equipment
- Remove fine particles and residues without damaging substrates
- Formulated for sensitive materials like optics, high-index glass, ceramics, and semiconductors
Certifications
