VECTOR HTR

Used as directed, VECTOR HTR minimizes scratching from in-process handling; protects substrates from staining; and prevents hard-to-clean slurry residues from adhering to the substrate surface for more effective downstream cleaning.  VECTOR HTR is recommended for use on mono-crystalline and multi-crystalline silicon.

For solar silicon producers, VECTOR HTR is used to rinse excess slurry residues from wafers post-wire sawing. Before demounting, the wafers are rinsed with a solution of 3% to 4% VECTOR HTR and DI water to eliminate staining and improve final cleaning results. Vector HTR is also used to wet-store wafers after demounting and prior to cleaning.

For semiconductor silicon producers, VECTOR HTR is recommended for the rinsing/washing of lapping plates. VECTOR HTR removes process debris from both the plate’s surface and grooves, thereby preventing the formation of iron oxide/abrasive particle aggregates that can dislodge and cause scratching. When used for rinsing/washing polishing pads, VECTOR HTR prevents staining; increases pad life by keeping the pore structure open; and reduces the frequency of pad conditioning.

Directions

• Post wire-saw solar silicon wafers should be immersed while still mounted into a bath of 3% to 4% VECTOR HTR in DI water, to prevent slurry residues from adhering to wafers and improve the results of subsequent cleaning and etching processes.
• Post-lapping or polishing, VECTOR HTR is used at dilutions ranging from 2% to 3%, depending on the condition and type of lapping equipment and the wafers.
• After the lapping plate has lifted, VECTOR HTR should be flooded over the surface. This breaks the surface tension between the wafers and the plate, and removes any remaining contamination, which could cause scratching and complicate handling. Wafers can then be removed, rinsed, and stored in a 2% Vector HTR bath.

Post-Process Rinse & Wet Storage

Certifications